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GC-BG202HAutomatic Grinder

This series of grinder is mainly designed for thinning of hard and?brittle materials. It adopts In-feed processing principle, and the?rotating wafer is ground through the rotation of grinding wheel and?vertical feed. This model of grinder is optimized with high rigidity,?suitable for efficient and high-precision processing of silicon carbide?wafers in addition to using in wafer processing.?


Product Parameters

1.?Basic specifications


Wafer processing size

8 inch, 6 inch

Wafer processing thickness

0.1mm~1mm

Grinding principle

In-feed

Grinding wheel size

12 inch (300mm)

Grinding mode

Auto/manual

Quantity of material boxes

2 (compatible with 8 inch, 6 inch)

Processing sides

Single/double-sided thinning (selection via program)

Weight

9500KG

Dimensions

3050x1495x2180

2.?Specifications of spindle


Number of spindles

2 (Z1, Z2)

Form of spindle bearing

Air bearing

Motor power of spindle

11KW

Rotation speed of spindle

1000rpm~3000rpm (Z1/Z2 can be set separately for the process)

3.?Specifications of Z-axis (Z1/Z2)


Travel of Z-axis

150mm

Speed of Z-axis

0.0001~0.08 mm/s

Maximum speed of Z-axis

50 mm/s

Minimum movement distance of Z-axis

0.1 μm

Resolution of Z-axis

0.1 μm

4.?Specifications of wafer table


The numbers of wafer table

3 ??(A、B、C)

Form of wafer table bearing

Air bearing

Wafer adsorption on table

Vacuum adsorption (the equipment is equipped with vacuum system)

Speed of wafer table

0~500rpm (set separately for each wafer table)

Switching mode of wafer table

Air turntable

Cleaning method for tablet table

Oilstone/two-fluid/brush



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